Shivam Negi, & S Ananthanarayanan Potti, final year B.Tech Chemical Engineering student from National Institute of Technology,Tiruchirappalli (NITT) has secured All India Rank 8 and 220 respectively in the competitive Graduate Aptitude Test in Engineering 2021 (GATE) examination
Shivam Negi, & S Ananthanarayanan Potti, final year B.Tech Chemical Engineering student from National Institute of Technology, Tiruchirappalli (NITT) has secured All India Rank 8 and 220
respectively in the competitive Graduate Aptitude Test in Engineering 2021 (GATE) examination conducted by IIT Bombay this year in the Chemical Engineering stream among 16705 students appeared in this stream all over the country.
Graduate Aptitude Test in Engineering (GATE) is a national examination conducted jointly by Indian Institute of Science (IISc) Bangalore and seven Indian Institutes of Technology (IITs) at Bombay, Delhi, Guwahati, Kanpur, Kharagpur, Madras and Roorkee on behalf of the National Coordination Board (NCB)-GATE, Department of Higher Education, Ministry of Education (MoE), Government of India. Qualifying in GATE is a mandatory requirement for seeking admission
and/or financial assistance to Postgraduate Programs (Master's and Doctoral) with Ministry of Education (MoE) and other Government Scholarships / Assistantships, subject to the admission criteria of the admitting institute. The GATE score is also used by some Public Sector Undertakings (PSUs) for their recruitment and by several other universities in India and abroad for admissions. GATE 2021 score will remain valid for THREE YEARS from the date of announcement of results.
Shivam had started his preparation for the GATE 2021 exam in March 2020 in his mid of 6th Semester B Tech Chemical Engineering just as the COVID lockdown was imposed. His preparation was by self-study through reference books, making notes and solving a lot of numerical problems. He also revealed that attempting a lot of mock tests helped achieve a high score by recreating the exam atmosphere. He encouraged all students to take up the GATE exam as it can create a lot of new opportunities for them. "Preparing for GATE will not only improve your technical background but also develop your mental fortitude in giving nationwide competitive exams and be a great test of one’s patience. Securing a good rank in the GATE exam will certainly open a lot of opportunities in the field of higher studies as well as jobs.", said Shivam.
Another Final year B.Tech student from the Department, S. Ananthanarayanan Potti, who secured AIR 220 also echoed the same thoughts. He began his preparation in September 2020 during his
seventh semester. Like Shivam, he too prepared through self-study. "Understanding the concepts well and applying them for problem-solving plays a major role in getting a good gate rank. Targeting subjects with more weightage like Heat Transfer, Mass Transfer and Process
Dynamic Control also helps in scoring more marks in such a limited time which is distributed between preparation and academic coursework.", said Ananthanaranyanan.
Both the students noted that they were encouraged and supported in their preparation by the faculty of the Chemical Engineering department and thanked them for the same. They also noted that the Chemical Engineering coursework at NITT had greatly helped them with their preparation for this exam. The students also thanked their parents and friends for supporting them and providing help.
Dr. Mini Shaji Thomas, the Director of NITT expressed her heartiest congratulations to the achievers. Dr P. Kalaichelvi, Professor and Head of the Chemical Engineering Department, along with the other faculty members and supporting staff, also congratulated both the students for their achievement.
Shivam Negi is now hoping to work as a staff scientist at BARC. S. Ananthanarayanan Potti is hoping to pursue postgraduate studies soon. Apart from these two achievers, 9 more students also qualified in this examination.